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Aug 7th, 2008
 
IntelliSense ships major new version of IntelliSuite, introduces Clean Room™
 
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IntelliSense announced a major new version of its market-leading software for the MEMS industry, IntelliSuite v8.5. IntelliSuite v8.5 includes upgrades to almost every module of IntelliSuite and introduces several groundbreaking industry-first features.

“Every corner of IntelliSuite has been updated, revamped, or given a fresh new look,” said Sandeep Akkaraju, CEO of IntelliSense. “You will see performance, stability and interface improvements across the board. From a fresh pixel-perfect look to blinding speed improvements to brand-new functionality, this is the best version of IntelliSuite yet.”

“In addition to the latest version of IntelliSuite, we are launching Clean Room, a new product line focused on process simulation and optimization,” said Akkaraju. “Clean Room provides an architecture to integrate process-specific simulators into a detailed process flow. We are also introducing two new process simulators: a 3D DRIE/ICP etch simulator to simulate deep silicon etching, and an atomistic simulation-based etch simulator for accurately simulating wet and dry etches.”

Some of the new features in the Clean Room™ package include:

IntelliFab™/FabViewer™

IntelliSense’s new process visualization tool creates photo-realistic renditions of even the most complex MEMS devices and process flows. The dynamic cross-sectioning feature makes it easy to debug a process or perform a failure analysis. Models created from the process flow can be automatically meshed and exported to analysis engines with one click.

RECIPE 3D™

The world’s only RIE/ICP etch simulator can now perform 3-D simulations of isotropic, RIE, and ICP/Bosch etching, or any combination of the three processes. RECIPE makes it easy to predict important parameters such as etch lag or sidewall angles.

IntelliEtch™

This new module has the power to simulate wet and dry etching at the atomistic level. IntelliEtch can simulate etching of high-order planes and non-flat substrates, as well as the effects of multi-masking or multiple process steps. After etch simulation, models can be directly exported to IntelliSuite for finite element analysis.

Clean Room™ also includes AnisE™, the industry’s first anisotropic etch simulator, MEMaterial™, the most comprehensive thin-film material database on the market, and IntelliMask™, a layout editor specifically designed for MEMS.

Some of the new features in IntelliSuite v8.5 include:

  • SYNPLE™ – the first schematic editor designed for MEMS now includes bus-based auto-wiring and can create 3D animations of system simulations
  • New, robust automeshing engine that transforms masks to meshes with one click
  • Capability to simulate advanced fluid-structure interaction in 3D
  • Multi-valent, pH-dependant reaction simulations in the Microfluidics module

 
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