Australian clean technology innovator, BluGlass Limited (ASX: BLG) has announced that it is now able to produce gallium nitride (GaN) with industry acceptable impurity levels using its breakthrough low temperature Remote Plasma Chemical Vapour Deposition (RPCVD) technology.
- In a world first, BluGlass’ RPCVD technology achieves a breakthrough in the reduction of impurities to industry standard levels in its gallium nitride (GaN) films
- The impurity levels have been independently verified
BluGlass’ RPCVD grown GaN layers are now demonstrating reduced levels of key impurities (carbon, hydrogen and oxygen) on par with the industry standard process, Metal Organic Chemical Vapor Deposition (MOCVD) for its GaN layers.
The impurity levels were measured by Evans Analytical Group (EAG), a widely recognised independent, global materials characterisation company, using Secondary Ion Mass Spectrometry (SIMS). EAG has confirmed that BluGlass has demonstrated carbon, oxygen and hydrogen impurities at levels less than 1x10^17 atoms per cm^3.
This is a significant step forward that BluGlass believes will help enable the demonstration of industry equivalent electrical properties in RPCVD grown films to reach its proof of concept milestone.
Following this achievement BluGlass will now seek to optimise the p-GaN layer in order to show the advantages of RPCVD to customers, including improved LED device efficiency over the current industry standard MOCVD produced devices.
BluGlass CEO Giles Bourne said “This achievement is a breakthrough for the company and is a critical step in proving to the industry and future customers the potential of our technology. Carbon and Oxygen are well known inhibitors of RPCVD, and their reduction will be viewed by the industry as a significant achievement. These reductions in impurities will greatly assist BluGlass in achieving its technical and commercial milestones.”
About BluGlass: BluGlass Limited is an Australian green technology company formed to commercialise a breakthrough in the Semiconductor Industry. BluGlass has invented a new process using Remote Plasma Chemical Vapour Deposition (RPCVD) to grow semiconductor materials such as gallium nitride (GaN) and indium gallium nitride (InGaN), crucial to the production of high efficiency devices such as next generation lighting technology Light Emitting Diodes (LEDs) with advanced low cost potential.
The RPCVD technology, because of its low temperature and highly flexible nature, offers many potential benefits over existing technologies including higher efficiency, lower cost and greater scalability. Contact: Stefanie Winwood +61 2 9334 2302, +61 433 307 853 email@example.com.