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Dec 6th, 2011
A*STAR and Tezzaron to develop 2.5D & 3D Silicon Interposers
The A*STAR Institute of Microelectronics (IME) and Tezzaron Semiconductor, a leader in 3D-ICs, have today announced a research collaboration agreement to develop and exploit advanced Through Silicon Interposer (TSI) technology. The two organizations will improve and refine the design and manufacture of silicon interposers and work to standardize the process, flows, and process design kits (PDKs). Initial early production devices are already in development, based on IME's TSI technology and incorporating 3D-ICs from Tezzaron. Fabrication will be completed in IME's state-of-the-art 300mm R&D Fab.
The resulting TSI technology from the collaboration will form the foundation for the TSI Consortium driven by IME, to be launched in early 2012. The TSI Consortium aims to optimize TSI technology through functional demonstration of 2.5D systems for cost effective and performance-driven applications. IME and Tezzaron have a history of cooperation dating back to 2001 when IME provided its copper line technologies to Tezzaron for their wafer stacking endeavors. IME has performed important research on many aspects of 3D IC technology including Through-Silicon Vias (TSVs), cooling, interconnects and interposers, while Tezzaron has focused on designing and building wafer-stacked 3D-ICs in its FaStack® process. The new research collaboration builds on the strengths of both organizations. Sources :
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