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> ALLVIA integrates Thin-film IPD capacitors in Silicon inter...
> ADVANCED PACKAGING: 3D IC, WLP & TSV
Feb 24th, 2010
ALLVIA integrates Thin-film IPD capacitors in Silicon interposers
ALLVIA Integrates Embedded Capacitors for Silicon Interposers and 3D Stacked Semiconductors. TSVs help for the integration of passive elements directly onto the silicon substrate for much higher densities.
ALLVIA, the first through-silicon via (TSV) foundry, has integrated embedded capacitors on Silicon Interposers, a key interface between a silicon device and an organic substrate needed for managing high interconnect densities. Capacitance values higher than 1,500 nF/cm2 have been achieved for the embedded capacitors developed for delivering power to the devices. 3D integration with ALLVIA’s through-silicon via technology allows much closer access to high value capacitors than previously possible, leading to a much higher level of electrical performance. Thin film capacitors ALLVIA’s silicon TSV interposers enable interconnect pitch matching between a high-density IC chip and an organic or a ceramic substrate. Further, they provide a very low stress interconnect to Si ICs that use low-k dielectrics. These benefits make ALLVIA’s interposers an attractive solution for advanced packaging of next generation logic devices. Silicon Interposers About ALLVIA
Located in Silicon Valley, ALLVIA is the first through-silicon via (TSV) foundry and introduced the term “through-silicon via” in both a 1997 business plan and a January 2000 technical article. With the full spectrum of facilities, IP and equipment, ALLVIA offers services for prototyping and full volume production of both front side and back side TSVs to the MEMS and semiconductor industries as well as silicon etching, copper plating, photolithography, CMP, etc Sources :
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