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Dec 16th, 2013
Equipment for heterojunction solar cells for an Asian customer
Roth & Rau AG and its parent company Meyer Burger Technology Ltd announced that it had successfully concluded a strategic contract with a leading Asian cell manufacturer to supply HELiAPECVD and HELiAPVD coating systems worth around EUR 12 million.
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Roth & Rau concludes a strategically important contract with a leading Asian cell manufacturer for the supply of disruptive coating systems for its first heterojunction line in the market.Delivery of the systems is planned for the first quarter of 2014.

For the production of high-performance heterojunction solar cells, the new customer is placing its trust in Meyer Burgers technologically advanced systems and extensive know-how. The HELiA-type systems form the key components of a production line to manufacture disruptive technology, heterojunction solar cells. The production line has the capacity to turn out 2,400 W/h. HJT solar cells have very high efficiencies which are currently in excess of 21%, as well as a very low temperature coefficient of around 0.20%/K and are used by the customer primarily for rooftop installations. Delivery of the systems is planned for the first quarter of 2014.

HELiAPECVD - maximum passivation

The key to the production of high-efficiency heterojunction solar cells are high-quality amorphous silicon layers (a-Si). HELiAPECVD systems enable the deposition both of intrinsic a-Si layers for the passivation and of doped layers for the manufacture of the electrical structures of the heterojunction cells. The deposition of the a-Si layers is carried out by means of PECVD (plasma-enhanced chemical vapour deposition) in a quasi-continuous process. A special patented plasma reactor - the S-Cube - was developed for this purpose by Roth & Rau. It guarantees homogenous deposition of a-Si layers with excellent passivation and electrical properties.

HELiAPVD - low-cost TCO coating

The contacting of heterojunction cells is carried out on both sides by means of transparent, conductive oxide layers (TCO), deposited using PVD (physical vapour deposition in special magnetron sputtering) in a continuous process. In the HELiAPVD sputtering unit, different contact layers (also multiple layers) can be deposited sequentially on the front and rear of the wafers, without the need to turn the wafers between the coating processes. Cylindrical sputter magnetrons enable a high target utilisation of over 85% to be achieved, ensuring a cost-effective coating process.



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