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> LED
May 14th, 2012
NGK developed GaN wafer for ultra high brightness LEDs
Created with original liquid phase epitaxial growth technology, NGK's GaN wafer has low defect density and colorless transparency over the whole wafer surface.
With the assistance of a research institute outside the Company, a light emitting test was performed on a LED element using NGK's GaN wafer. The test showed a world top class internal quantum efficiency of 90% at an injection current of 200mA. The GaN wafer achieves a luminous efficiency of 200lm/W, which is twice as efficient as those on the market today. Under the same brightness, this reduces power consumption by 50%. Since the wafer reduces heat generation within LEDs, it lengthens lifetime of LEDs and enables downsizing of lighting equipment. Sources :
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