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Jul 12th, 2012
New PlasmaPro® 100 system from Oxford Instruments offers impressive hardware and process solutions for both Production and R & D customers
Oxford Instruments has this week launched the PlasmaPro 100 system, their latest generation etch and deposition tool, offering world leading performance.
The system is ideally suited to many key market applications, including MEMS, HBLED, Semiconductor Electronics, Failure Analysis and Photovoltaics. It is an advanced, innovative system that has been developed by Oxford Instruments to address the exacting needs of Production users, who demand not only the very latest technological innovations, but also the superb customer support offered by the Company.
Providing a common platform for all Oxford Instruments Plasma Technology’s processes and technologies, the PlasmaPro 100 is a highly configurable system, with process chambers that are available as standalone modules or in cluster configurations.
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