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Jul 10th, 2014
TSVs and cantilever etching facilitated at the CiS, Erfurt, using Oxford Instruments plasma system
The CiS Research Institute for Microsensor Systems and Photovoltaics GmbH, Germany has recently placed an order with Oxford Instruments for a PlasmaPro100 Estrelas etch system for research & development of MEMS components.
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The PlasmaPro100 Estrelas with Brooks wafer handler offers highest process performance with industry leading throughput, while maintaining excellent ease of use. Oxford Instruments system was chosen for the excellent results obtained on vertical and tapered TSV and cantilever etching together with the high level customer support offered.

Dr. Thomas Ortlepp, Director R&D and Technology at CiS commented, “We chose the Oxford Instruments PlasmaPro 100 Estrelas system for a number of reasons. Very low tilt together with excellent uniformity, profile control and the possibility to work with very low power processes for precise and controlled landing etches, made this the tool of our choice. Additionally, the ease of use that enables fast turnaround in process development convinced us that this is the right tool for our research institute.”

“The proven performance and versatility of the Oxford Instruments PlasmaPro 100 Estrelas made it the ‘system of choice’ for CiS", says Dr. David Haynes, Sales, Service and Marketing Director, Oxford Instruments Plasma Technology. He continued: “Due to a simple widespread source and chamber-design the time to process is short. Additionally the possibility of reducing coil-power down to very low values enables processes with highest accuracy needed for innovative sensor developments.”

About Oxford Instruments plc
Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. Innovation has been the driving force behind Oxford Instruments' growth and success over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion.

The first technology business to be spun out from Oxford University, Oxford Instruments is now a global company with over 2300 staff worldwide and is listed on the FTSE250 index of the London Stock Exchange (OXIG).  Its objective is to be the leading provider of new generation tools and systems for the research and industrial sectors with a focus on nanotechnology. Its key market sectors include nano-fabrication and nano-materials. The company's strategy is to expand the business into the life sciences arena, where nanotechnology and biotechnology intersect

This involves the combination of core technologies in areas such as low temperature, high magnetic field and ultra high vacuum environments; Nuclear Magnetic Resonance; x-ray, electron, laser and optical based metrology;atomic force microscopy; optical imaging; advanced growth, deposition and etching.

Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. Its products, expertise, and ideas address global issues such as energy, environment,security and health.
About Oxford Instruments Plasma Technology
Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.

These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

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