Tegal Corporation, (Nasdaq: TGAL) an innovator of specialized production solutions for the fabrication of advanced MEMS, power ICs and optoelectronic devices, announced today it has appointed veonis Technologies GmbH, Puchheim, Germany, as its agent for silicon DRIE and dielectric DRIE products in Germany. veonis Technologies is a leading pan-European supplier of equipment, materials and services to the semiconductor and related industries, bringing cost-effective solutions to the European market, together with its partners from Japan and the United States.
 
"Tegal Corporation is now completely focused on offering best-of-breed Deep Reactive Ion Etch systems to the MEMS, Power Device, and 3D-IC markets," said Paul Werbaneth, Vice President of Marketing and Applications, Tegal Corporation.  "Together with veonis Technologies, our strong new partner in Germany, we are looking to expand the market, particularly with those customers who place high value on the quality of results delivered by their DRIE tool suppliers. The combination of Tegal's significant DRIE process know-how, together with veonis' excellent reputation for customer support, is great for Tegal, and is great also for our German customers."

"We are proud and honoured to have been chosen by Tegal Corporation as their agent for Germany," said Manfred Schwarz, Managing Director, veonis Technologies.  "Tegal's DRIE product line has already gained wide acceptance and enjoys an excellent reputation among the customers in Germany. The solid base of installed Tegal DRIE products will allow us to expand further. Our focus will be on supporting existing customers, as well as on introducing the Tegal DRIE products to new customers eager to work with Tegal's proven and established products.  With the upturn in the market, the timing of our engagement with Tegal could not have been better."

Tegal DRIE tools are employed in numerous research and development laboratories throughout the world, engaging in both commercial and academic research programs, and are also found in MEMS foundries and other dedicated commercial High Volume Manufacturing lines world-wide. Of particular note is Tegal's patented SHARP – Super High Aspect Ratio Process, achieving silicon DRIE aspect ratios of > 100:1 in production environments. Tegal is hosting a webinar dedicated to SHARP on Wednesday 28 April 2010 at 11:00am PDT; sign-up for the free webinar is at https://www1.gotomeeting.com/register/706411833.