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Aug 20th, 2013
Veeco introduces GENxplor Molecular Beam Epitaxy system
Veeco's new GENxplor™ uses the proven GEN10™ growth chamber design and features unmatched process flexibility, perfect for materials research on emerging technologies such as UV LEDs, high-efficiency solar cells, and high-temperature superconductors.
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Its efficient single frame design combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. Because the manual system is integrated on a single frame, installation time is reduced. The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and easier serviceability when compared to other MBE systems. When coupled with Veeco’s recently introduced retractable sources, the GENxplor system represents the state-of-the-art in oxide materials research.

Key features are:

  • High quality epitaxial layers on substrates up to 3" in diameter
  • Unique, single frame architecture improves ease-of-use, provides convenient source access and enhanced serviceablility
  • Efficient, all-in-one design combines manual system with on-board electronics for 40% lab space savings compared to other MBE systems
  • Ideal for cutting edge research on a wide variety of materials including GaAs, nitrides and oxides
  • Molly® software integrates easy recipe writing, automated growth control and always-on data recording
  • Direct scalability to GEN20™, GEN200® and GEN2000® MBE system

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