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Aug 22nd, 2013
 
Veeco introduces GENxplor Molecular Beam Epitaxy system
 
Veeco Instruments Inc. (Nasdaq: VECO) introduced the GENxplor™ Molecular Beam Epitaxy (MBE) Deposition System, the industry’s first fully-integrated MBE system for the compound semiconductor R&D market.
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Veeco"s New GENxplor R&D MBE System.
Veeco's New GENxplor R&D MBE System.
  • Industry’s First Fully-Integrated MBE System for the Compound Semiconductor R&D Market
  • Ideal for materials research on emerging technologies such as UV LEDs, high-efficiency solar cells, and high-temperature superconductors

The GENxplor creates high quality epitaxial layers on substrates up to 3” in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides.

The compound semiconductor R&D community asked for a more affordable, flexible, and easy-to-use MBE system and Veeco has delivered with the GENxplor,” commented Jim Northup, Veeco’s Vice President and General Manager. “We have repackaged Veeco’s industry-leading MBE technology into a novel ‘all-in-one’ design that combines the reactor and electronics on a single frame. It will change the way researchers use MBE.”

The GENxplor uses Veeco’s proven GEN10™ growth chamber design and features unmatched process flexibility, ideal for materials research on emerging technologies such as UV LEDs, high-efficiency solar cells, and high-temperature superconductors. Its efficient single frame design combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. Because the manual system is integrated on a single frame, installation time is reduced. The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and allows easier serviceability when compared to other MBE systems. When coupled with Veeco’s recently introduced retractable sources, the GENxplor system represents the state-of-the-art in oxide materials research.

 

 
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