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May 10th, 2012
 
Veeco ion beam deposition tool matches PVD speed for optical thin films
 
Veeco Instruments Inc. (Nasdaq:VECO) debuted the SPECTOR-HT ion beam deposition (IBD) tool for thin-film deposition in optical products, such as lasers, telecommunications chips, and more.
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It reportedly creates high-quality films in a cost-effective manufacturing process compared to physical vapor deposition (PVD), evaporative coatings, and ion-assisted deposition.

Veeco claims up to 400% higher throughput, 300% better target utilization and 50% higher material uniformity with SPECTOR-HT, over previous SPECTOR generations. The SPECTOR-HT is fully automated, achieving accelerated deposition rates at speeds comparable to PVD. It delivers an increased deposition rate on lot sizes up to twice as large as those in previous SPECTOR generations.

The SPECTOR-HT is debuting at the SPIE Photonics Europe Trade Show in Brussels, Belgium, booth #G323.

Veeco makes equipment to develop and manufacture optoelectronics, light-emitting diodes (LEDs), solar cells, hard disk drives (HDDs) and other devices. Visit www.veeco.com.

 

 
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