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Aug 9th, 2012
Zeiss kicks off €7M EUV optics project
German company will lead a new effort to shrink extreme ultraviolet (EUV) lithography resolution from 20 nm to 14 nm.
The optics giant Carl Zeiss is to lead a new project to improve the resolution of extreme ultraviolet (EUV) optics well beyond what will be possible with the first generation of production systems.
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